What absorbs at 684 cm⁻¹ in an FTIR spectrum?
A band near 684 cm⁻¹ can point to several functional groups. Below are the most likely assignments, ranked by how much published evidence supports each — every one traceable to literature (DOI) and cross-validated against our 130,000+ reference spectra and knowledge graph.
Backed by 5 cited sources
可能的官能团归属
| 官能团 | 支持性事实 | 引用来源 | 最高置信度 |
|---|---|---|---|
| Alkyl C-H | 2 | 2 | 1.0 |
| Alkene (C=C) | 1 | 1 | 1.0 |
| Metal oxygen | 1 | 1 | 1.0 |
| Silicon-oxygen (Si-O) | 1 | 1 | 1.0 |
排名反映了累积的文献证据，而非单一的权威规则。请始终对照您的样品背景进行确认。
这些分配背后的文献
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置信度 1.0
“684,and areattributed tothevibrations of theSiO 2 The nitrogen adsorption/desorption isotherms of Gh-B group (Figure 3).”
Allaoui 等 - 2020 - Kinetic Study of the Adsorption of Polyphenols fro DOI: 10.1155/2020/7293189 -
Alkyl C-H 置信度 1.0
“The bending vibrations of plane verified at positions 684, 833 cm-1 C-H The bending vibrations of plane verified at positions 684, 833 and 957 [27,28].”
New Hybrid PVC/PVP Polymer Blend Modified with Er2O3 Nanoparticles for Optoelectronic Applications DOI: 10.3390/polym15030684 -
Silicon-oxygen (Si-O) 置信度 1.0
“LLM confirmed rule peak-group candidate”
Magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphology of aluminum thin films deposited on SiO2/Si substrates DOI: 10.1007/s00339-021-04892-0 -
Metal oxygen 置信度 1.0
“In addition, a sloping decreasing peak with a peak minimum at cm-1 684 ascribed by the asterisk indicates TiO 2.”
Multi-Modal Compositional Analysis of Layered Paint Chips of Automobiles by the Combined Application of ATR-FTIR Imaging, Raman Microspectrometry, and SEM/EDX DOI: 10.3390/molecules24071381 -
Alkene (C=C) 置信度 1.0
“FTIR spectra shown in Figure 9 reveal peaks of C=C bending at 684 cm-1, C-H bending at 744 cm-1, C-H bending at 818 cm-1, C-H bending at 872 cm-1, C-N stretching aromatic amine at 1261 cm-1, C-C stretching aromatic ring at 1493 cm-1, C=C st”
Synthesis of a Polyaniline Nanoparticle Using a Solution Plasma Process with an Ar Gas Bubble Channel DOI: 10.3390/polym11010105
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