What absorbs at 1018 cm⁻¹ in an FTIR spectrum?
A band near 1018 cm⁻¹ can point to several functional groups. Below are the most likely assignments, ranked by how much published evidence supports each — every one traceable to literature (DOI) and cross-validated against our 130,000+ reference spectra and knowledge graph.
Backed by 8 cited sources
可能的官能基指派
| 官能基 | 支持事實 | 引用來源 | 最高信心 |
|---|---|---|---|
| C-O single bond | 7 | 6 | 0.95 |
| Silicon-oxygen (Si-O) | 2 | 2 | 0.95 |
| Siloxane (Si-O-Si) | 1 | 1 | 0.9 |
| Carbohydrate | 1 | 1 | 0.9 |
| Alkyl C-H | 1 | 1 | 0.8 |
| Hydroxyl (O-H) | 1 | 1 | 0.8 |
排名反映累積的文獻證據，而非單一權威規則。請務必根據您的樣品背景進行確認。
這些指派背後的文獻
-
C-O single bond 信心 0.95
“Explicit assignment in text: 'ether group (-C-O-C-) as the peak at 1018'”
Daud 等 - 2013 - Preparation and Characterization of Plasticized Pa DOI: 10.1063/1.4858749 -
Silicon-oxygen (Si-O) 信心 0.95
“Explicit assignment in text”
Ashby 等 - 2013 - The effect of alkyl chain length on the level of c DOI: 10.1007/s11051-013-1425-8 -
C-O single bond 信心 0.9
“Explicit assignment in text.”
Bushra 等 - 2013 - Microwave assisted acetylation of mung bean starch DOI: 10.1002/star.201200081 -
Silicon-oxygen (Si-O) 信心 0.9
“Explicit assignment: 'characteristic Si-O-C stretching frequencies at 1012-1018 cm-1'.”
Jung 和 Park - 2012 - Synthesis and Photoelectronic Properties of Therma DOI: 10.5012/bkcs.2012.33.6.2031 -
信心 0.9
“Explicit assignment: 'bands at 1072 and 1018 cm-1 that can be associated with C-O deformation of secondary alcohols'”
Agatonovic-Kustrin 等 - 2021 - HPTLC and FTIR Fingerprinting of Olive Leaves Extr DOI: 10.3390/molecules26226892 -
C-O single bond 信心 0.9
“C-O stretching vibration”
Bellido-Aguilar 等 - 2019 - Effect of a fluoroalkyl-functional curing agent on DOI: 10.1016/j.surfcoat.2019.02.006 -
Carbohydrate 信心 0.9
“Explicit assignment”
Durak 等 - 2021 - Changes in Chemical Composition and Accumulation o DOI: 10.3390/ijms22020511 -
Siloxane (Si-O-Si) 信心 0.9
“Band centered at 1018 cm-1 assigned to Si-O-Si tetrahedral group.”
Golubevas 等 - 2017 - Fabrication and investigation of high-quality glas DOI: 10.1039/c7ra05188c
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